Atomic Layer Deposition (ALD) Reactor System
Subject: Atomic Layer Deposition (ALD) Reactor SystemSolicitation Number: N00173-26-Q-TB02Notice Type: SOLICITNAICS: 334513Set-Aside: Total Small BusinessNotice Published: 09-01-26Response Due: 09-14-26Agency: Department of the NavyOffice: NAVAL RESEARCH LABORATORYContact: TALISA BOYD This email address is being protected from spambots. You need JavaScript enabled to view it.Office Address: WASHINGTON, DC 20375-5328Place of Performance: Washington, DC
Click for official SAM (FBO) notice, additional information, and accompanying attachments
COMBINED SYNOPSIS / SOLICITATION FOR COMMERCIAL ITEMS This is a combined synopsis/solicitation for commercial products or commercial services prepared in accordance with part 12. This announcement constitutes the only solicitation. Offers are being requested and a separate written solicitation will not be issued. Solicitation number N00173-26-Q-TB02 is issued as a request for quotation (RFQ) for an atomic layer deposition (ALD) reactor for the uniform and conformal deposition of oxide, nitride, and metal films with atomic-layer precision onto substrates of high aspect ratio surface topographies using both traditional thermal atomic layer deposition (ALD) and plasma enhanced ALD (PE-ALD) modes. This acquisition is set-aside for small business concerns. This solicitation incorporates provisions and clauses by reference. The full text of provisions and clauses may be accessed electronically at www.acquisition.gov. The Defense Priorities and Allocations System (DPAS) and assigned rating are DO-C9. See solicitation attachment, below.